Chemical Processing of Dielectrics, Insulators and Electronic Ceramics
Volume 606
£25.99
Part of MRS Proceedings
- Editors:
- Anthony C. Jones, Inorgtech Limited, UK
- Janice Veteran, Advanced Micro Devices, Texas
- Donald Mullin, SPA WAR System Center, California
- Reid Cooper, University of Wisconsin, Madison
- Sanjeev Kaushal, Tokyo Electron America, Texas
- Reprinted: June 2014
- Date Originally Published: August 2000
- availability: Available
- format: Paperback
- isbn: 9781107413207
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This book focuses on the creative use of chemistry in the fabrication of a variety of oxide and non-oxide materials which are likely to play a crucial role in the development of the next generation of microelectronics devices. It includes inorganic precursor chemistry, gas-phase and solid-state chemistry, materials science, chemical physics and chemical engineering. Highlights include the deposition of high-k dielectric gate oxides, ferroelectric oxide films for infrared and memory applications, low-k dielectrics, TiN and TaN diffusion barriers, and fresh precursors for III-V nitrides. The emphasis is on chemical methods for the controlled deposition of thin films, for which chemical vapor deposition (CVD) has proven to be a useful and versatile technique. Of particular interest is the use of liquid-injection MOCVD for the deposition of oxide multilayers and superlattices. Solution deposition techniques such as sol-gel, metalorganic decomposition (MOD), hydrothermal processing are also prominently featured. Topics include: CVD of oxide ceramics; CVD of nonoxide ceramics; solution deposition of electronic ceramics; alternative chemical processing methods and characterization of electronic ceramics..
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×Product details
- Reprinted: June 2014
- Date Originally Published: August 2000
- format: Paperback
- isbn: 9781107413207
- length: 328 pages
- dimensions: 229 x 152 x 17 mm
- weight: 0.44kg
- availability: Available
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