Ion Beams - New Applications from Mesoscale to Nanoscale
Volume 1354
CAD$109.95 (C)
Part of MRS Proceedings
- Editors:
- John Baglin, IBM Almaden Research Center, New York
- Daryush Ila, Fayetteville State University
- Giovanni Marletta, Universita degli Studi di Catania
- Ahmet Öztarhan, Aegean University, Turkey
- Date Published: November 2011
- availability: Available
- format: Hardback
- isbn: 9781605113319
CAD$
109.95
(C)
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Symposium II, "Ion Beams─New Applications from Mesoscale to Nanoscale," was held at the 2011 MRS Spring Meeting, April 25-29, in San Francisco, California. This symposium welcomed presentations on ion-beam engineering and characterization of materials properties, structure, topography, and functionality, spanning dimensions from the mesoscale to the nanoscale. While the unique capabilities of ion-beam techniques in the diverse emerging fields of nanoscience and nanotechnology are fast becoming critical for many new applications, the flexibility of ion-beam techniques now enables the development of new tools that can integrate tailoring of nanoscale patterns and structures with unique in-situ imaging and analysis. The recent evolution of such instrumentation has energized new programs, both basic and applied, in fast-developing areas ranging over advanced semiconductor integration, information storage, sensors, plasmonics, molecular engineering, biomaterials, and many aspects of the development of alternative energy resources. In a field displaying such rapid evolution on many fronts, it is appropriate for us to pause occasionally and review the overall state of the field, and its emerging opportunities and challenges.
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×Product details
- Date Published: November 2011
- format: Hardback
- isbn: 9781605113319
- length: 176 pages
- dimensions: 235 x 158 x 15 mm
- weight: 0.4kg
- contains: 100 b/w illus. 3 tables
- availability: Available
Table of Contents
Part I. Reviews and Research Reports:
1. Universal biomolecule binding interlayers created by energetic ion bombardment Marcela Bilek
2. Neural cell attachment on metal ion implanted glass surfaces Emel Sokullu Urkac
3. Cluster ion beam processing: review of current and prospective applications Isao Yamada
4. Nano-engineering with a focused helium ion beam Diederik Maas
5. Multi-ion beam lithography and processing studies Bill Appleton
6. Ion irradiation effects in silicon nanowires Kai Nordlund
7. Folding graphene with swift heavy ions Sevilay Akcöltekin
8. Ion irradiation on phase change materials Emanuele Rimini
9. Ion beams for synthesis and modifications of nanostructures in semiconductors Anand Pathak
10. Raman scattering study of Si nanoclusters formed in Si through a double Au implantation Durga Mahapatra
11. Effects of hydrogen ion implantation and thermal annealing on structural and optical properties of single-crystal sapphire Mengbing Huang
12. Post-CMOS integration of nanomechanical devices by direct ion beam irradiation of silicon Francesc Perez-Murano
13. Enhanced adhesion of coating layers by ion beam mixing: an application for nuclear hydrogen production Jae-Won Park
14. Structural changes induced by swift heavy ion beams in tensile strained Al(1-x)InxN/GaN hetero-structures Anand Pathak
15. 5 MeV Si ion modification on thermoelectric SiO2/SiO2+Cu multilayer films Cydale Smith
16. Study of scalable IBS nanopatterning mechanisms for III-V semiconductors using in-situ surface characterization Jean-Paul Allain
17. Modeling of approximated electron transport across ion beam patterned quantum dot nanostructures Jonathan Lassiter
18. RBS, XRD, raman and AFM studies of microwave synthesized Ge nanocrystals Anand Pathak
19. Comparison of ion beam and electron beam induced transport of hot charge carriers in metal-insulator-metal junctions Marika Schleberger
Part II. Forum Report:
20. Future directions for ion beam technology and research: forum report John Baglin.
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