Thin Films for Optical Waveguide Devices and Materials for Optical Limiting
Volume 597
Part of MRS Proceedings
- Editors:
- Keiichi Nashimoto, Fuji Xerox Co. Ltd., Japan
- Ruth Pachter, Air Force Research Laboratory, U.S.A.
- Bruce W. Wessels, Northwestern University, Illinois
- Joseph Shmulovich, Lucent Technologies, New Jersey
- Alex -K. -Y. Jen, University of Washington
- Keith Lewis, Defence Evaluation and Research Agency, Worcestershire
- Richard Sutherland, Science Applications International Corp.
- Joseph W. Perry, University of Arizona
- Date Published: October 2000
- availability: Available
- format: Hardback
- isbn: 9781558995055
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This book, first published in 2000, provides a multidisciplinary discussion of the science and technology of optical materials and devices for materials scientists, chemists, and physicists. Symposium Z, Thin Films for Optical Waveguide Devices, covers materials properties, thin-film processing and optical waveguide device integration. The range of thin films include ferroelectrics, dielectrics, glasses, and polymers with epitaxial, glass, or polymeric structures. Discussions of thin-film processing include sputtering, MBE, PLD, MOCVD, FHD, sol-gel, and spin casting for luminescent waveguides, electro-optic waveguides, magneto-optic waveguides, and photonic crystals. Symposium PP, Materials for Optical Limiting II, addresses the development of materials for optical limiters and tunable filters which can suppress undesired radiation. Topics include two-photon absorbers and photorefractives, as well as continued emphasis on reverse saturable absorption, liquid crystals, and carbon-based suspensions. It also covers new materials modeling and synthesis, nonlinear materials characterization, device applications using new materials and analyses of materials impact on optical limiting applications.
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×Product details
- Date Published: October 2000
- format: Hardback
- isbn: 9781558995055
- length: 488 pages
- dimensions: 229 x 152 x 27 mm
- weight: 0.82kg
- availability: Available
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