Amorphous and Heterogeneous Silicon Thin Films: Fundamentals to Devices – 1999
Volume 557
Out of Print
Part of MRS Proceedings
- Editors:
- Howard M. Branz, National Renewable Energy Laboratory, Golden, Colorado
- Robert W. Collins, Pennsylvania State University
- Hiroaki Okamoto, University of Osaka, Japan
- Subhendu Guha, United Solar Systems Corp., Michigan
- Ruud Schropp, Universiteit Utrecht, The Netherlands
- Reprinted: June 2014
- Date Originally Published: December 1999
- availability: Unavailable - out of print
- format: Paperback
- isbn: 9781107413931
Out of Print
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Applications requiring large-area semiconductor coverage rely increasingly on amorphous and heterogeneous silicon materials because they can be deposited at low cost on a variety of substrates. This volume, first published in 1999, covers the range from fundamental research to the device applications of these materials. A special session on medium-range order is featured, and confirms the belief that ordering correlates with the electronic quality of a-Si:H films. Important experimental observations on metastable effects in a-Si:H are also reported, as are devices and processing strategies. Topics include: growth and properties; high-rate deposition; recrystallization, amorphization and porous silicon; ordering and hydrogen; metastability; defects, band tails and transport; heterogeneous materials and devices; thin-film transistors and displays; solar cells; and detectors, imagers and other devices.
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×Product details
- Reprinted: June 2014
- Date Originally Published: December 1999
- format: Paperback
- isbn: 9781107413931
- length: 912 pages
- dimensions: 229 x 152 x 46 mm
- weight: 1.2kg
- availability: Unavailable - out of print
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