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Look Inside Advances in GaN, GaAs, SiC and Related Alloys on Silicon Substrates

Advances in GaN, GaAs, SiC and Related Alloys on Silicon Substrates

Volume 1068

£50.00

Part of MRS Proceedings

  • Date Published: August 2008
  • availability: Available
  • format: Hardback
  • isbn: 9781605110387

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  • To meet increasingly challenging and complex system requirements, as well as to stay cost effective, it is not enough to use one single semiconductor materials system. Major efforts have, therefore, been made to combine the low cost and well established Si-based CMOS processing attributes with the superior performance attributes of compound semiconductors (CS). Such a combination will enable performance superior to that achievable with either CS and CMOS alone, with CMOS affordability. The strong and increasing interest in GaN, GaAs, SiC and related alloys on silicon substrates indicates the worldwide importance of these materials and devices. This book represents the latest technical advancements and information on III-V materials and devices on silicon substrates from universities, national laboratories and industries worldwide. Topics include: GaN-based electronic devices and sensors on silicon; GaN-based optical devices on silicon; GaN and related alloys on silicon growth and integration techniques; conventional III-V materials and devices on silicon; and silicon and other materials on silicon.

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    Product details

    • Date Published: August 2008
    • format: Hardback
    • isbn: 9781605110387
    • length: 289 pages
    • dimensions: 235 x 160 x 25 mm
    • weight: 0.6kg
    • availability: Available
  • Table of Contents

    Preface
    Acknowledgments
    Part I. GaN Based Electronic Device and Sensors on Silicon
    Part II. GaN Based Optical Devices on Silicon
    Part III. GaN and Related Alloys on Silicon Growth and Integration Techniques
    Part IV. Conventional III-V Materials and Devices on Silicon
    Part V. Silicon and Other Materials on Silicon
    Author index
    Subject index.

  • Editors

    Tingkai Li, Sharp Laboratories, Washington

    Joan M. Redwing, Pennsylvania State University

    Michael Mastro, U.S. Naval Research Laboratory, Washington

    Edwin L. Piner, Nitronex Corporation, North Carolina

    Armin Dadgar, Otto-von-Guericke-Universität Magdeburg, Germany

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