Properties and Processing of Vapor-Deposited Coatings
Volume 555
Part of MRS Proceedings
- Editors:
- Roger N. Johnson, Pacific Northwest National Lab, Washington
- Woo Y. Lee, Stevens Institute of Technology, New Jersey
- Michael A. Pickering, Morton Advanced Materials, Massachusetts
- Brian W. Sheldon, Brown University, Rhode Island
- Reprinted: June 2014
- Date Originally Published: April 1999
- availability: Available
- format: Paperback
- isbn: 9781107413917
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This book focuses on advances associated with generating processing-microstructure-property-performance relationships of coatings produced by chemical vapor deposition (CVD) and physical vapor deposition (PVD) methods. Various coating materials and applications are discussed, ranging from producing high-quality diamond coatings to developing large-scale or novel diamond-like carbon (DLC) processes, understanding metal-ceramic interface adhesion behavior in thermal barrier coatings, identifying corrosion-resistant ceramic coating materials for high-temperature structural applications, and preparing polymeric thin films for integrated circuits. Rapid advances in industrial process scale-up and the development of a large-scale DLC coating chamber, based on a novel process concept called 'plasma ion immersion process,' is presented. Progress in understanding the reaction kinetics, particularly gas phase chemistry, of complex CVD processes is noted. Overall, the book clearly shows that vapor-deposited coatings are being actively pursued for diverse technological benefits, and that the coating community is increasingly relying on generating appropriate processing-microstructure-property relationships to guide integrated coating process and product development.
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×Product details
- Reprinted: June 2014
- Date Originally Published: April 1999
- format: Paperback
- isbn: 9781107413917
- length: 446 pages
- dimensions: 229 x 152 x 23 mm
- weight: 0.59kg
- availability: Available
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