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Look Inside Thin Films – Stresses and Mechanical Properties VIII

Thin Films – Stresses and Mechanical Properties VIII

Volume 594

Part of MRS Proceedings

  • Date Published: September 2000
  • availability: Unavailable - out of print
  • format: Hardback
  • isbn: 9781558995024

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  • An understanding of mechanical behavior is crucial for a wide variety of thin-film technologies such as semiconductor devices and packaging (including advanced interconnects, dielectrics and silicides), information storage media, hard coatings, microelectromechanical systems (MEMS), and biomedical devices. The influence of mechanical behavior is seen in thin-film performance and reliability, as well as morphology development during processing and service. The increased need for understanding of these properties has challenged modern materials science because concepts, models and techniques developed for bulk materials often do not apply in small dimensions. This book addresses key issues in the still growing field of thin-film mechanical behavior. Topics include: multilayer thin films; metallic thin films; epitaxy, deposition parameters, microstructure and stresses; thin films for applications in MEMS; polymer thin films; mechanical properties of amorphous and crystalline carbon; adhesion and fracture; reliability in microelectronics; and nanoindentation and advanced testing techniques.

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    Product details

    • Date Published: September 2000
    • format: Hardback
    • isbn: 9781558995024
    • length: 568 pages
    • dimensions: 229 x 152 x 32 mm
    • weight: 0.92kg
    • availability: Unavailable - out of print
  • Editors

    Richard Vinci, Lehigh University, Pennsylvania

    Oliver Kraft, Max-Planck-Institut für Metallforschung, Germany

    Neville Moody, Sandia National Laboratories, California

    Paul Besser, AMD-Motorola Alliance Logic Technology, U.S.A.

    Edward Shaffer, II, Dow Chemical Company, Michigan

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