Amorphous and Heterogeneous Silicon Thin Films: Fundamentals to Devices – 1999
Volume 557
$40.99 (C)
Part of MRS Proceedings
- Editors:
- Howard M. Branz, National Renewable Energy Laboratory, Golden, Colorado
- Robert W. Collins, Pennsylvania State University
- Hiroaki Okamoto, University of Osaka, Japan
- Subhendu Guha, United Solar Systems Corp., Michigan
- Ruud Schropp, Universiteit Utrecht, The Netherlands
- Date Published: December 1999
- availability: Temporarily unavailable - available from TBC
- format: Hardback
- isbn: 9781558994645
$
40.99
(C)
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Applications requiring large-area semiconductor coverage rely increasingly on amorphous and heterogeneous silicon materials because they can be deposited at low cost on a variety of substrates. This volume, first published in 1999, covers the range from fundamental research to the device applications of these materials. A special session on medium-range order is featured, and confirms the belief that ordering correlates with the electronic quality of a-Si:H films. Important experimental observations on metastable effects in a-Si:H are also reported, as are devices and processing strategies. Topics include: growth and properties; high-rate deposition; recrystallization, amorphization and porous silicon; ordering and hydrogen; metastability; defects, band tails and transport; heterogeneous materials and devices; thin-film transistors and displays; solar cells; and detectors, imagers and other devices.
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×Product details
- Date Published: December 1999
- format: Hardback
- isbn: 9781558994645
- length: 914 pages
- dimensions: 229 x 152 x 48 mm
- weight: 1.4kg
- availability: Temporarily unavailable - available from TBC
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